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Nanometer-Sized Domains in Langmuir-Blodgett Films for Patterning SiO2

Year: 2010

Journal: pubs.acs.org/Langmuir © American Chemical Society, 20111221

Authors: Sho Kataoka, Yasutaka Takeuchi, and Akira Endo

Organizations: National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan

In this study, we prepared Langmuir-Blodgett films with domains ranging from 20 to 100 nm in size by using perfluorinated fatty acids. The domain size of the obtained LB films is markedly smaller than the ordinary domain size of hydrocarbons and fluorocarbons on the micrometer scale. The domains were prepared by controlling their growth through the addition of 2-propanol to the subphase of Langmuir monolayers. Furthermore, the prepared domains in the LB films were used as templates for patterning SiO2 films. The obtained SiO2 films have completely negative structures
compared with those of the domains in the LB films.