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    The fabrication of the ultra-thin polyvinylidene fluoride dielectric films for nanoscale high energy density capacitors

    Year: 2017

    Journal: Polymer, Volume 132, DEC 6, page 193–197

    Authors: Xie, Xiong; Zhou, Mengbin; Lv, Luqiang; Liu, Shuangyi; Shen, Jun

    Organizations: Key Industry Technology Innovation Fund of Science and Technology Development Board of Xiangcheng district of Suzhou [XJ201608]; Science and Technology Project of Beibei district of Chongqing [2016-27]; Foundation of the State Key Laboratory of Mechanical Transmission of Chongqing University of China [SKLMT-ZZKT-2017M15]; Program of Hundreds talents of Chinese Academy of Sciences; Fundamental and advanced technology Research Funds of Chongqing [cstc2015jcyjBX0103]

    Keywords: Polyvinylidene fluoride (PVDF); Dielectric properties; High breakdown field

    Nanoscale polymer dielectric films are critical demanded by continuously integration and miniaturization of energy electronic devices. In this paper, PVDF films are fabricated by present developed HSCA-LBD method, and thus, the dielectric properties of PVDF films with nanoscale thickness are investigated in detail for the first time. The results show that the films with thickness lower than 100 nm present excellent dielectric performances, the effective dielectric constant is up to 15 with loss less than 0.1 in frequency range of 1K - 2 MHz. The breakdown field of them is up to 171 MV/m with the energy density up to 2 J/cm(3), which are in same level with those of reported PVDF films with thickness higher than 10 mm. Moreover, the mechanisms of dielectric behaviors are also discussed in detail. (C) 2017 Elsevier Ltd. All rights reserved.
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