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Ultrahydrophobic PMMA micro- and nano-textured surfaces fabricated by optical lithography and plasma etching for X-ray diffraction studies

Year: 2011

Journal: Microelectronic Engineering Volume, 88, Issue 8, August 2011, Pages 1660-1663, 20111221

Authors: Angelo Accardo a,b,c, Francesco Gentile a,c , Federico Mecarini a,c , Francesco De Angelis a,c , Manfred Burghammer b , Enzo Di Fabrizio a,c , Christian Riekel b

Organizations: a Center of Bio-Nanotechnology and Engineering for Medicine, University Magna Græcia, Viale Europa, Catanzaro 88100, Italy, b European Synchrotron Radiation Facility, B.P. 220, F-38043 Grenoble Cedex, France, c Italian Institute of Technology, Via Morego, Genova 13163, Italy

Polymeric (PMMA) ultrahydrophobic surfaces with contact angles up to about 170° have been fabricated and used in the context of synchrotron radiation experiments on biological droplets. The different microfabrication processes included either an optical lithography phase followed by a plasma texturing one or a single step deep reactive ion etch attack.

The drying of several biological solution droplets has been monitored. Room temperature evaporation experiments (lysozyme, lactalbumin, cytochrome C, doxorubicin and synthesized peptides) finally result in the formation of easily detachable hollow residuals because of the low interaction between the ultrahydrophobic substrate and the aqueous droplet while pilot experiments (bovine insulin) in a sitting-drop environment bring to the formation of well defined crystals. Recent results about in situ X-ray diffraction experiments by SAXS & WAXS (Small and Wide Angle X-ray Scattering) μ-beam techniques confirm that the presence of such surfaces influences the formation of crystal or fibril structures. These substrates represent indeed a suitable support to study biological and inorganic droplets in a near contact-free environment exploiting the homogeneous evaporation rate induced by the ultrahydrophobicity of the system.