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    A Molecular Approach for Mitigation of Aluminum Pitting based on Films of Zinc(II) and Gallium(III) Metallosurfactants

    Year: 2019

    Journal: Chem.-Eur. J., Volume 25, NOV 7, page 14048–14053

    Authors: Weeraratne, A. D. K. Isuri; Hewa-Rahinduwage, Chathuranga C.; Gonawala, Sunalee; Luo, Long; Verani, Claudio N.

    Organizations: National Science FoundationNational Science Foundation (NSF) [NSF-CHE-1500201, NSF-CHE1904584]; Wayne State University; Thomas C. Rumble Fellowship from the Graduate School at WSU

    Keywords: aluminum corrosion; aluminum pitting; gallium complexes; metallosurfactants; zinc complexes

    The use of metallosurfactants to prevent pitting corrosion of aluminum surfaces is discussed based on the behavior of the metallosurfactants [Zn-II(L-N2O2)H2O] (1) and [Ga-III(L-N2O3)] (2). These species were deposited as multilayer Langmuir-Blodgett films and characterized by IR reflection absorption spectroscopy and UV/Vis spectroscopy. Scanning electron microscopy images, potentiodynamic polarization experiments, and electrochemical impedance spectroscopy were used to assess corrosion mitigation. Both metallosurfactants demonstrate superior anticorrosion activity due to the presence of redox-inactive 3d(10) metal ions that enhance the structural resistance of the ordered molecular films and limit chloride mobility and electron transfer.
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