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Langmuir-Blodgett films of membrane lipid in the presence of hybrid silsesquioxane, a promising component of biomaterials

Year: 2019

Journal: Mater. Sci. Eng. C-Mater. Biol. Appl., Volume 105, DEC

Authors: Skrzypiec, Marta; Weiss, Marek; Dopierala, Katarzyna; Prochaska, Krystyna

Organizations: Ministry of Science and Higher Education in Poland within Faculty of Chemical Technology, Poznan University of Technology [03/32/SBAD/0901]; Ministry of Science and Higher Education in Poland within Faculty of Technical Physics, Poznan University of Technology [06/62/SBAD/1923]

Keywords: Phospholipid; Polyhedral oligomeric silsesquioxanes; Phospholipid-POSS interactions; Langmuir-Blodgett film; Binary mixtures; Wettability; Surface free energy; Atomic force microscopy

Functionalized polyhedral oligomeric silsesquioxanes (POSS) derivatives have great potential in biomedical applications such as tissue engineering, drug delivery, biosensors, dental composites and biomedical devices. Having the above in mind, in this paper, the study of the surface characteristics of binary Langmuir-Blodgett films consisting of an open cage silsesquioxane POSS-poly (ethylene glycol) (POSS-PEG) and 1,2-dimyristoyl-sn-glycero-3-phosphoethanolamine (DMPE), as a representative of phospholipid was conducted based on contact angle measurements of three liquids. The measured values of the contact angle (with water, formamide and diiodomethane as the wetting liquids) allowed to calculate surface free energy of the films from van Oss et al. approach. The film structure of the deposited layers was evaluated using an atomic force microscope. Analysis of the obtained results led to the conclusion, that the pure DMPE molecules create agglomerates onto a solid substrate, whereas the POSS-PEG molecules form a homogenous monolayer. After an addition of POSS-PEG to lipid film, changes in the surface properties are visible. The wettability as well as surface free energy depend on the molar ratio of both components. The AFM images shed more light on the changes of the DMPE monolayer topography caused by the POSS-PEG addition.