QSense QCM-D is a powerful method used to study etching at surfaces and interfaces. The time-resolved, nanoscale analysis enables researchers and industry professionals to gain insight into etching dynamics, including material removal rates and surface modifications under different conditions.

How QCM-D measures etching and what the data looks like

The frequency shift (Δf) measured by QCM-D reflects mass change at the surface. An increase in Δf indicates mass loss, and vice versa. When material desorbs, or leaves, the sensor surface, the sensed mass will decrease and cause an increase in Δf. The magnitude of the shift is related to the mass lost from the surface.

The Dissipation shift (ΔD) provides information about the energy loss in the system under study, where an increase in ΔD indicates and increase in energy loss and vice versa. When etching occurs, the roughness of the surface may increase and result in an increase in ΔD.

 

Etching  -  Phenomena

 

QSense measures at the nanoscale

The detection range of QSense technology spans from nanometers to micrometers, depending on the viscoelasticity of the applied film or medium. Molecules and entities that are typically analyzed are for example lipids, proteins and other biomolecules, surfactants, polymers, nanoparticles and cells.