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Bilayer self-assembly on a hydrophilic, deterministically nanopatterned surface

Year: 2013

Journal: NANO RESEARCH, Vol. 6, p 784-794, 20150722

Authors: Smith, Gregory S.; Jung, Seung-Yong; Browning, James F.; Keum, Jong K.; Lavrik, Nickolay V.; Alemseghed, Mussie G.; Collier, C. Patrick

Organizations: Oak Ridge Natl Lab, Biol & Soft Matter Div, Oak Ridge, TN 37831 USA; Oak Ridge Natl Lab, Ctr Nanophase Mat Sci, Oak Ridge, TN 37831 USA; Oak Ridge Natl Lab, Chem & Engn Mat Div, Oak Ridge, TN 37831 USA; Univ Cincinnati, Dept Chem & Mat Engn, Cincinnati, OH 45221 USA

We present measurements of the in situ, microscopic architecture of a self-assembled bilayer at the interface between a regularly nanopatterned surface and an aqueous sub-phase using neutron reflectometry. The substrate is patterned with a rectangular array of nanoscale holes. Because of the high quality of the pattern, using neutron reflectometry, we are able to map the surface-normal density distribution of the patterned silicon, the penetration of water into the pattern, and the distribution of a deposited film inside and outside of the etched holes. In this study, 1,2-dilauroyl-sn-glycero-3-phosphocholine (DLPC) single bilayers were deposited on the hydrophilic patterned surface. For bilayers deposited either by vesicle fusion (VF) or by the Langmuir-Schaefer (L-S) technique, the most consistent model found to fit the data shows that the lipids form bilayer coatings on top of the substrate as well as the bottoms of the holes in an essentially conformal fashion. However, while there is a single bilayer on the unetched silicon surface, the lipids coating the bottoms of the holes form a complex bimodal structure consistent with a rough surface produced by the etching process. This study provides insight into film transfer both outside and inside regular nanopatterned features.