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    Chemical Patterning of Ultrathin Polymer Films by Direct-Write Multiphoton Lithography

    Year: 2011

    Journal: J. Am. Chem. Soc., 2011, 133 (16), pp 6138–6141, 20110906

    Authors: Jeon H. †, Schmidt R. ‡, Barton J.E. ‡, Hwang D.J. †, Gamble L.J., Castner D.G., Grigoropoulos C.P. *†, Healy K.E. *‡§

    Last authors: Kevin E. Healy

    Organizations: †Laser Thermal Laboratory, Department of Mechanical Engineering, ‡Department of Bioengineering, and §Department of Materials Science and Engineering, University of California, Berkeley, California 94720, United States Department of Bioengineering, University of Washington, Seattle, Washington 98185, United States

    Country: USA, US, United States, United States of America, America

    We applied 2-photon laser ablation to write subdiffraction nanoscale chemical patterns into ultrathin polymer films under ambient conditions. Poly(ethylene glycol) methacrylate brush layers were prepared on quartz substrates via surface-initiated atom-transfer radical polymerization and ablated to expose the underlying substrate using the nonlinear 2-photon absorbance of a frequency-doubled Ti:sapphire femtosecond laser. Single-shot ablation thresholds of polymer films were 1.5 times smaller than that of a quartz substrate, which allowed patterning of nanoscale features without damage to the underlying substrate. At a 1/e2 laser spot diameter of 0.86 μm, the features of exposed substrate approached 80 nm, well below the diffraction limit for 400 nm light. Ablated features were chemically distinct and amenable to chemical modification.