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    Controllable photopatterning and photochemical properties of novel copolymer containing dianthracene langmuir–blodgett films

    Year: 2012

    Journal: Journal of Polymer Science Part B: Polymer Physics, 2012, 50 (2), 139-147, 20131009

    Authors: Tiesheng Li, Wenjian Xu, Caiqin Tang, Min Zhang, Yangjie Wu, Tokuji Miyashita

    Organizations: Department of Chemistry, Zhengzhou University, Zhengzhou 450052, PR China; The Key Lab of Chemical Biology and Organic Chemistry of Henan Province, Zhengzhou 450052, PR China; The Key Lab of Advanced Nano-Information Materials of Zhengzhou, Zhengzhou 450052, China; Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Katahira 2-1-1, Aoba, Sendai 980-8577, Japan

    A new series of copolymer poly(N-hexadecylmeth acrylamide-co-bis(anthracen-9-ylmethyl) 2-allylmalonate) [poly(HDMA-co-DAnMAMA)]s containing swallow-tailed double anthracenyl groups and long alkyl group are designed and synthesized. The main route of the photochemical reaction of the p(HDMA-DAnMAMA)copolymer Langmuir–Blodgett (LB) films is dimerization reaction between the anthracenyl groups under the irradiation of both 365 and 248 nm for limiting irradiation time, resulting to a fine negative-tone pattern. On the other hand, the anthracenyl groups act just as photodecomposition group under 248 nm for longer irradiation time, resulting to a fine positive-tone pattern. Consequently, positive-tone and negative-tone pattern are obtained by choosing not only a suitable irradiation light wavelength, but the irradiation time at 248 nm. Moreover, it is found that the exposed and unexposed regions of copolymer LB films irradiated at 248 nm have solubility differentiation in gold etchant (I2/NH4I/C2H5OH/H2O), that is to say, the gold photopatterns with the maximal resolution of the used mask can be obtained easily without any development process.