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Deposition and fabrication of alkanethiolate gold nanocluster films on TiO2(1 1 0) and the effects of plasma etching

Year: 2007

Journal: Surface Science, Volume 601, Issue 22, 15 November 2007, Pages 5121-5126, 20111221

Authors: Matsumoto, Patricia Nickut, Takeshi Sawada, Hironori Tsunoyama, Kazuya Watanabe, Tatsuya Tsukudaa, Katharina Al-Shamery and Yoshiyasu Matsumoto

Organizations: National Institutes of Natural Sciences, Institute for Molecular Science, Okazaki, Aichi 444-8585, Japan, The Graduate University for Advanced Studies (SOKENDAI), Department of Photoscience, Hayama, Kanagawa 240-0193, Japan, Institute of Pure and Applied Chemistry, Carl von Ossietzky University Oldenburg, P.O. Box 2503, 26111 Oldenburg, Germany

Deposition and fabrication of films of Au nanoclusters protected by alkanethiolate ligands are attempted on a TiO2(1 1 0) surface and the structures of films are observed by a scanning tunneling microscope (STM). Effects of oxygen and hydrogen-plasma etching in addition to UV irradiation on the structure and chemical composition of the films are also investigated by using STM and X-ray photoelectron spectroscopy. Alkanethiolate Au nanoclusters are produced using a modified Brust synthesis method and their LB films are dip-coated on TiO2(1 1 0). Alkanethiolate Au nanoclusters are weakly bound to the substrate and can be manipulated with an STM tip. Net-like structures of alkanethiolate Au nanoclusters are formed by a strong blast of air. Oxygen-plasma etching removes alkanethiolate ligands and simultaneously oxidizes Au clusters. At room temperature, prolonged oxygen-plasma etching causes agglomeration of Au nanoclusters. UV irradiation removes ligands partly, which makes Au nanoclusters less mobile. The net-like structure of alkanethiolate Au clusters produced by a blast of air is retained after oxygen and hydrogen-plasma etching.