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    Graphene Oxide as a Monoatomic Blocking Layer

    Year: 2012

    Journal: ACS Nano, 2012, 6 (9), 8022-8029, 20131009

    Authors: Søren Petersen, Magni Glyvradal, Peter Bøggild, Wenping Hu, Robert Feidenhans'l, Bo W. Laursen

    Organizations: Nano-Science Center & Department of Chemistry, University of Copenhagen, Copenhagen, Denmark; Nano-Science Center & Niels Bohr Institute, University of Copenhagen, Copenhagen, Denmark; DTU Nanotech, Technical University of Denmark, Lyngby, Denmark; Institute of Chemistry, Chinese Academy of Sciences, Beijing, China

    Monolayer graphene oxide (mGO) is shown to effectively protect molecular thin films from reorganization and function as an atomically thin barrier for vapor-deposited Ti/Al metal top electrodes. Fragile organic Langmuir–Blodgett (LB) films of C22 fatty acid cadmium salts (cadmium(II) behenate) were covered by a compressed mosaic LB film of mGO flakes. These hybrid LB films were examined with atomic force microscopy (AFM) and X-ray reflectivity, both with and without the metal top electrodes. While the AFM enabled surface and morphology analysis, the X-ray reflectivity allowed for a detailed structural depth profiling of the organic film and mGO layer below the metal top layers. The structure of the mGO-protected LB films was found to be perfectly preserved; in contrast, it has previously been shown that metal deposition completely destroys the first two LB layers of unprotected films. This study provides clear evidence of the efficient protection offered by a single atomic layer of GO.