Year: 2017
Journal: J. Alloy. Compd., Volume 725, NOV 25, page 510–518
Authors: Mokurala, Krishnaiah; Mallick, Sudhanshu; Bhargava, Parag; Siol, Sebastian; Klein, Talysa R.; van Hest, Maikel F. A. M.
Organizations: Solar Energy Research Institute for India and the U.S. (SERIIUS) - U.S. Department of Energy (Office of Science) [DE AC36-08G028308]; Solar Energy Research Institute for India and the U.S. (SERIIUS) - U.S. Department of Energy (Office of Basic Energy Sciences) [DE AC36-08G028308]; Solar Energy Research Institute for India and the U.S. (SERIIUS) - U.S. Department of Energy (Energy Efficiency and Renewable Energy, Solar Energy Technology Program) [DE AC36-08G028308]; Solar Energy Research Institute for India and the U.S. (SERIIUS) - U.S. Department of Energy (Office of International Affairs) [DE AC36-08G028308]; Government of India [IUSSTF/JCERDC-SERIIUS/2012]; MAGEEP - SERIIUS visiting scholars program
Keywords: Dip coating; Dipping cycles; Cu2NiSnS4; Annealing; Optoelectronic properties; Photo response