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    Interface properties of organic materials investigated by using ultraviolet photoelectron spectroscopy

    Year: 2003

    Journal: Synthetic Metals 138 (2003) 131-134, 20111221

    Authors: M.B. Casu, P. Imperia, J.E. Wong, S. Schrader

    Organizations: Universität Potsdam, Institut für Physik, LS-PKM, Am Neuen Palais 10, D-14469 Potsdam, Germany

    The properties of the interface between a thin layer of native SiO2 and a low molecular compound were studied by means of ultraviolet photoelectron spectroscopy (UPS). The investigated material, an amphiphilic derivative of 2,5-diphenyl-1,3,4-oxadiazole (NADPO), was prepared by using the Langmuir-Blodgett (LB) technique. It is of interest since its electronic properties do not depend on the preparation conditions and it is also being candidate for use in optoelectronic devices. The UPS measurements were performed at the beam line Seya F2.2 at HASYLAB (Hamburg, Germany). This beamline is of a 1 mSeya-Namioka monochromator type, equipped with two gratings, which cover the photon energy range from 4 to 40 eV. The photoelectrons were collected with a Vacuum Generators ADES 400 angle resolving spectrometer system at room temperature. The base pressure during the experiment was 1 x 10-10 mbar. We investigated the interface properties depending on the number of monolayers (2, 4, 6 and 8) of well oriented LB films, monitoring the highest occupied molecular orbital (HOMO) energy position.