Contact
    Start Publications Interference lithography with functional block copolymer ...
    ←  Publication Finder
    Attension

    Interference lithography with functional block copolymer blends: Hierarchical structuration and anisotropic wetting

    Year: 2017

    Journal: Eur. Polym. J., Volume 90, MAY, page 25–36

    Authors: Patrocinio, David; Laza, Jose M.; Rodriguez-Hernandez, Juan; Navas, David; Soriano, Nastassia; Redondo, Carolina; Vilas, Jose L.; Leon, Luis M.

    Organizations: Consejo Superior de Investigaciones Cientificas (CSIC); Ministerio de Economia y Competitividad (MINECO) [MAT2013-47902-C2-1-R, MAT2016-78437-R]

    Keywords: Surface; Nanostructuring; Functionalization; Block copolymer; Wettability; Anisotropic wetting

    This manuscript describes the preparation of hierarchically, i.e. micro and nanometer scale ordered surfaces with variable functionality by simultaneously combining the microfabrication using Laser Interference Lithography (LIL) and the self-assembly of block copolymers occurring at the nanometer scale. The block copolymers employed in this study are a double hydrophobic poly (2,3,4,5,6-pentafuorostyrene)-block-polystyrene (P5FS(31)-b-PS21) and an amphiphilic polystyrene-block-poly(acrylic acid) (PS20-b-PAA(9)) diblock copolymer. The incorporation of these block copolymers in the photosensitive mixture resulted in surfaces with hierarchically micro and nanostructured interfaces with either hydrophobic or hydrophilic surface chemical composition. Moreover, in comparison with microstructured surfaces prepared using statistical copolymer with similar composition, the use of block copolymers enhanced both the surface wettability changes and the final anisotropic wetting. We evidenced herein that by preparing unidirectional micrometer size patterns with either P5FS(31)-b-PS21 or PS20-b-PAA(9) the wetting anisotropy increases with the hydrophobicity or the hydrophilicity of the surface.
    View publication