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    Investigation of the pulsed electrochemical deposition of ZnO

    Year: 2012

    Journal: Electrochimica Acta, 2012, 80 pp 60-67, 20130115

    Authors: Christian Dunkel, Franziska Lüttich, Harald Graaf, Torsten Oekermann, Michael Wark

    Organizations: Institute of Physical Chemistry and Electrochemistry, Leibniz University Hannover, 30167 Hannover, Germany, Laboratory of Industrial Chemistry, Ruhr University Bochum, 44801 Bochum, Germany, Institute of Physics, Chemnitz University of Technology, 09107 Chemnitz, Germany

    The influence of pulse parameters on the morphology of ZnO prepared by pulsed cathodic electrodeposition from oxygen-saturated aqueous ZnCl2 solution on ITO (indium tin oxide)/glass substrates was investigated. It was found that the ratio between the pulse and the pause duration has a crucial influence on the crystal growth, reaching the highest density of the films with pause/pulse-ratios between 0.25 and 1. Longer pauses cause an Ostwald-like ripening of the ZnO crystals and therewith a strong change in the crystal morphology from roundly shaped to hexagonal. Also the hydrophilicity of the substrate resulting from pre-treatment has a crucial influence on the deposited films, leading to films only consisting of few large and separately grown ZnO crystals for highly hydrophilic substrates and an increasing fraction of small densely grown ZnO crystals with increasing hydrophobicity.