Modifying surface properties of diamond-like carbon films via nanotexturing

Diamond-like amorphous carbon (DLC) films have been grown by pulsed-dc plasma-enhanced chemical vapour deposition on silicon wafers, which were previously patterned by means of colloidal lithography. The substrate conditioning comprised two steps: first, deposition of a self-assembled monolayer of silica sub-micrometre spheres (~300?nm) on monocrystalline silicon (~5?cm2) by Langmuir–Blodgett technique, which acted as lithography template; second, substrate patterning via ion beam etching (argon) of the colloid samples (550?eV) at different incidence angles. The plasma deposition of a DLC thin film on the nanotextured substrates resulted in hard coatings with distinctly different surface properties compared with planar DLC. Also, in-plane anisotropy was generated depending on the etching angle. The samples were morphologically characterized by scanning electron microscopy and atomic force microscopy. The anisotropy introduced by the texture was evidenced in the surface properties, as shown by the directional dependences of wettability (water contact angle) and friction coefficient. The latter was measured using a nanotribometer and a lateral force microscope. These two techniques showed how the nanopatterns influenced the tribological properties at different scales of load and contact area. This fabrication technique finds applications in the industry of microelectromechanical systems, anisotropic tribological coatings, nanoimprint lithography, microfluidics, photonic crystals, and patterned surfaces for biomedicine.