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    Optical amplification and stability of spiroquaterphenyl compounds and blends

    Year: 2015

    Journal: JOURNAL OF THE EUROPEAN OPTICAL SOCIETY-RAPID PUBLICATIONS, Vol. 10, p -, 20170208

    Authors: Fuhrmann-Lieker, T.; Lambrecht, J.; Hoinka, N.; Kiurski, M.; Wiske, A.; Hagelstein, G.; Yurttaguel, N.; Abdel-Awwad, M.; Wilke, H.; Messow, F.; Hillmer, H.; Salbeck, J.

    Organizations: Univ Kassel, Inst Chem, Macromol Chem & Mol Mat, D-34109 Kassel, Germany; Univ Kassel, Ctr Interdisciplinary Nanosci & Technol, D-34109 Kassel, Germany; Univ Kassel, Inst Nanostruct Technol & Analyt, Technol Elect, D-34109 Kassel, Germany

    In this contribution, we present a systematic investigation on a series of spiroquaterphenyl compounds optimised for solid state lasing in the near ultraviolet (UV). Amplified spontaneous emission (ASE) thresholds in the order of 1 mu J/cm(2) are obtained in neat (undiluted) films and blends, with emission peaks at 390 +/- 1 nm for unsubstituted and meta-substituted quaterphenyls and 400 +/- 4 nm for para-ether substituted quaterphenyls. Mixing with a transparent matrix retains a low threshold, shifts the emission to lower wavelengths and allows a better access to modes having their intensity maximum deeper in the film. Chemical design and blending allow an independent tuning of optical and processing properties such as the glass transition.