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    Oxidation of Alkylsilane-Based Monolayers on Gold

    Year: 2004

    Journal: Langmuir 20 (2004) 9636-9645, 20111221

    Authors: Thomas M. Owens, Bonnie J. Ludwig, Kevin S. Schneider, Daniel R. Fosnacht, Bradford G. Orr, and Mark M. Banaszak Holl

    Organizations: Department of Chemistry, University of Michigan, Ann Arbor, Michigan 48109-1055; Department of Physics, University of Michigan, Ann Arbor, Michigan 48109-1120; The Applied Physics Program, University of Michigan, Ann Arbor, Michigan 48109-1120

    The oxidation of alkylsilane monolayers on Au has been studied by X-ray photoelectron spectroscopy, reflection-absorption infrared spectroscopy, contact-angle measurements, and scanning tunneling microscopy. Exposure of the monolayers at 298 K to pure O2 or H2O (>5 x 10-5 Torr and >150 000 L) does not cause oxidation. Ambient atmosphere only causes oxidation if direct sight lines are maintained to the sample. Ozone exposure results in rapid monolayer oxidation. Oxidation initially occurs only at the Si atom, resulting in formation of a cross-linked siloxane monolayer that retains alkyl surface termination. Prolonged ozone exposures result in the oxidation and subsequent loss of the alkyl chain.