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    Pattern Formation in Dewetting Poly(tert-butyl acrylate)/Polyhedral Oligomeric Silsesquioxane (POSS) Bilayer Films

    Year: 2006

    Journal: Langmuir, 2006, 22 (16), pp 6734–6738, 20111221

    Authors: Rituparna Paul and Alan R. Esker

    Organizations: Macromolecules and Interfaces Institute and the Department of Chemistry (0212), Virginia Polytechnic Institute and State University, Blacksburg, Virginia 24061

    The surface morphology of dewetting poly(tert-butyl acrylate) (PtBA) and trisilanolphenyl-POSS (TPP) bilayers has been studied as a function of time at 95 °C. For short annealing times, only the upper nanoparticle (TPP) layer dewets from the underlying PtBA layer. The number and lateral dimensions of the holes in the upper TPP layer increase with increasing annealing times, forming interconnected rim structures. At later annealing times, scattered holes that reach down into the PtBA layer are observed among the interconnected rim structures. Fractal nanofiller (TPP)-rich aggregates are found at the bottom of the scattered holes.