Photocatalytic properties of Ti–V oxides thin films

In this work, the photocatalytic properties of Ti–V oxides thin films with 19 and 23 at.% ofvanadium addition have been outlined. The films were deposited by the high energy reactivemagnetron sputtering method. X-ray photoelectron spectroscopy measurements were done in orderto determine the chemical composition and binding energy of the elements on the samples surface.Additionally, based on wettability measurements, the water contact angles were evaluated andwere equal to ca. 94° and 55° for thin films with 19 and 23 at.% of V, respectively. This testifiesabout hydrophilic and hydrophobic properties, respectively. Photoactivity of thin films wasdetermined by percent decomposition of phenol for 5 hours during UV–vis radiation exposure.The highest photocatalytic activity of 6.2%/cm2 was obtained for thin films with 19 at.% of V.It has been found that an increase in V amount in Ti–V oxides thin films to 23 at.% results inlowered to 3%/cm2 photocatalytic activity.