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    Properties of aluminum oxide thin film obtained by metal plasma immersion ion implantation and deposition after zirconium-based pretreatment

    Year: 2015

    Journal: VACUUM, Vol. 121, p 32-41, 20170208

    Authors: dos Santos, Demetrio Jackson; Tavares, Lara Basilio; Antunes, Renato Altobelli; Droppa, Roosevelt, Jr.; da Silva, Tiago Fiorini; Salvadori, Maria Cecilia

    Organizations: Univ Fed Abc, Ctr Engn Modelagem & Ciencias Sociais Aplicadas, BR-09210580 Santo Andre, SP, Brazil; Univ Fed Abc, Ctr Ciencias Nat & Humanas, BR-09210580 Santo Andre, SP, Brazil; Univ Sao Paulo, Inst Fis, BR-05389970 Sao Paulo, SP, Brazil

    Aluminum oxide thin films were obtained by metal plasma immersion ion implantation and deposition (MePIIID) and subsequently converted by a zirconium based surface pretreatment. Thin films atomic composition was studied using Rutherford backscattering spectrometry (RBS) and forward recoil spectrometry (FRS), especially for hydrogen measurement. Film morphology and thickness were investigated by atomic force microscopy (AFM) and field emission scanning electron microscopy (FE-SEM). Wettability was assessed by contact angle measurements. The corrosion behavior was investigated using EIS measurements and potentiodynamic polarization curves. Results pointed out to the deposition of a highly oxidized film with high hydrogen content with smooth surface. After conversion, wettability was greatly enhanced as denoted by the 50% decrease of the contact angle after conversion. The conversion treatment decreased the values of i(corr) from 1.51 to 0.75 mu A cm(-2). Excellent corrosion resistance was achieved when an acrylic coating was applied over the converted MePIIID layer, further decreasing i(corr) 0.004 mu A cm(-2). (C) 2015 Elsevier Ltd. All rights reserved.