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    Self-Assembled Masks for the Transfer of Nanometer-Scale Patterns into Surfaces: Characterization by AFM and LFM

    Year: 2002

    Journal: Nano Letters 2002, Vol. 2, No. 2, 131-135, 20111221

    Authors: Maria-Victoria Meli, Antonella Badia, Peter Grütter, and R. Bruce Lennox

    Organizations: Department of Chemistry, McGill University, 801 Sherbrooke Street West, Montreal, Quebec H3A 2K6, Canada, and Department of Physics, McGill University, 3600 University Street, Montreal, Quebec H3A 2T8, Canada

    A new methodology has been used to create an extensive array of nanometer-sized features. The Ar+ milling of Si/SiOx and gold surfaces covered with a diblock copolymer mask with an intrinsic topological nanopattern yields transfer of the nanopattern. Mask removal was tracked using XPS, and the final arrays were characterized by AFM and LFM. Friction contrast observed throughout the transferred pattern is associated with a surface water layer.