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    Temperature dependence of formation of a supported phospholipid bilayer from vesicles on SiO2

    Year: 2002

    Journal: PHYSICAL REVIEW E 66, 051905 (2002), 20100827

    Authors: Reimhult E., Höök F., Kasemo B.

    Last authors: B. Kasemo

    Organizations: Department of Applied Physics, Chalmers University of Technology, Göteborg SE-412 96, Sweden

    Country: Sweden

    Adsorption of egg-phosphatidylcholine vesicles and bilayer formation on a SiO 2 surface was investigated in the temperature range 278–303 K using the quartz crystal microbalance-dissipation technique. The critical coverage for the vesicle => bilayer transition is found to decrease with increasing temperature. The temperature dependence of the time-scale characterizing this transition can be represented in the Arrhenius form. Higher temperatures produce a bilayer with fewer trapped, nonruptured vesicles.