Start Publications The Role of Oxidative Debris on Graphene Oxide Films
KSV NIMA

The Role of Oxidative Debris on Graphene Oxide Films

Year: 2013

Journal: CHEMPHYSCHEM, Vol. 14, p 4002-4009, 20150703

Authors: Lopez-Diaz, David; Mercedes Velazquez, Maria; Blanco de La Torre, Santiago; Perez-Pisonero, Ana; Trujillano, Raquel; Garcia Fierro, Jose Luis; Claramunt, Sergi; Cirera, Albert

Organizations: Univ Salamanca, Dept Quim Fis, Fac Ciencias Quim, E-37008 Salamanca, Spain; Grp Antolin Ingn SA, GRAnPH Nanotech, Burgos 09007, Spain; Univ Salamanca, Fac Ciencias Quim, Dept Quim Inorgan, E-37008 Salamanca, Spain; CSIC, Inst Catalisis & Petroleoquim, E-28049 Madrid, Spain; Univ Barcelona, Dept Elect, MIND IN2UB, E-08028 Barcelona, Spain

We study the effect of oxidative impurities on the properties of graphene oxide and on the graphene oxide Langmuir-Blodgett films (LB). The starting material was grupo Antolin nanofibers (GANF) and the oxidation process was a modified Hummers method to obtain highly oxidized graphene oxide. The purification procedure reported in this work eliminated oxidative impurities decreasing the thickness of the nanoplatelets. The purified material thus obtained presents an oxidation degree similar to that achieved by chemical reduction of the graphite oxide. The purified and non-purified graphene oxides were deposited onto silicon by means of a Langmuir-Blodgett (LB) methodology. The morphology of the LB films was analyzed by field emission scanning microscopy (FE-SEM) and micro-Raman spectroscopy. Our results show that the LB films built by transferring Langmuir monolayers at the liquid-expanded state of the purified material are constituted by close-packed and non-overlapped nanoplatelets. The isotherms of the Langmuir monolayer precursor of the LB films were interpreted according to the Volmer's model.