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    Thin Al2O3 barrier coatings onto temperature-sensitive packaging materials by atomic layer deposition

    Year: 2011

    Journal: Surface and Coatings Technology, Volume 205, Issues 21-22, 25 August 2011, Pages 5088-5092, 20111221

    Authors: Terhi Hirvikorpi a , Mika Vähä-Nissi a, Juha Nikkola b , Ali Harlin a , Maarit Karppinen c

    Organizations: a VTT Technical Research Centre of Finland, Biologinkuja 7, Espoo, P.O. Box 1000, FI-02044 VTT, Finland, b VTT Technical Research Centre of Finland, P.O. Box 1300, FI-33101 Tampere, Finland, c Aalto University, School of Chemical Technology, Department of Chemistry, Laboratory of Inorganic Chemistry, P.O. Box 16100, FI-00076 AALTO, Finland

    Thin (25 nm) and highly uniform Al2O3 coatings have been deposited at relatively low temperature of 80 and 100 °C onto various bio-based polymeric materials employing the atomic layer deposition (ALD) technique. The work demonstrates that the ALD-grown Al2O3 coating significantly enhances the oxygen and water vapor barrier performance of these materials. Promising barrier properties were revealed for polylactide-coated board, hemicellulose-coated board as well as various biopolymer (polylactide, pectin and nano-fibrillated cellulose) films.