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    TiO2/SiO2 multilayer as an antireflective and protective coating deposited by microwave assisted magnetron sputtering

    Year: 2013

    Journal: Opto-Electronics Review, June 2013, Volume 21, Issue 2, pp 233-238, 20131119

    Authors: M. Mazur 1, D. Wojcieszak 1, J. Domaradzki 1, D. Kaczmarek 1, S. Song 2 3, F. Placido 2 3

    Organizations: 1. Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, 11/17 Janiszewskiego, 50-372, Wrocław, Poland2. University of the West of Scotland, High Street, Paisley, PA1 2BE, UK3. Scottish Universities Physics Alliance, University Ave., G128QQ, Glasgow, UK

    In this paper designing, preparation and characterization of multifunctional coatings based on TiO2/SiO2 has been described. TiO2 was used as a high index material, whereas SiO2 was used as a low index material. Multilayers were deposited on microscope slide substrates by microwave assisted reactive magnetron sputtering process. Multilayer design was optimized for residual reflection of about 3% in visible spectrum (450–800 nm). As a top layer, TiO2 with a fixed thickness of 10 nm as a protective film was deposited. Based on transmittance and reflectance spectra, refractive indexes of TiO2 and SiO2 single layers were calculated. Ultra high vacuum atomic force microscope was used to characterize the surface properties of TiO2/SiO2 multilayer. Surface morphology revealed densely packed structure with grains of about 30 nm in size. Prepared samples were also investigated by nanoindentation to evaluate their protective performance against external hazards. Therefore, the hardness of the thin films was measured and it was equal to 9.34 GPa. Additionally, contact angle of prepared coatings has been measured to assess the wetting properties of the multilayer surface.