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    Ultraviolet light-induced wettability control of ultrathin atomic layer deposited TiO2 film surface

    Year: 2017

    Journal: Thin Solid Films, Volume 642, NOV 30, page 151–156

    Authors: Jang, Youngmoon; Yang, Byungchan; Shin, Jeongwoo; An, Jihwan

    Organizations: National Research Foundation under Ministry of Education, Korea [NRF-2015R1D1A1A01058963]; Ministry of Trade, Industry and Energy (MOTIE), KOREA, through Education Support program for Creative and Industrial Convergence [N0000717]

    Keywords: Atomic layer deposition; Titanium dioxide; Thin films, wettability, ultraviolet surface treatment

    Here, we show that the surface wettability of ultrathin (6-16 nm) TiO2 films deposited by atomic layer deposition (ALD) can be tuned by an ultraviolet (UV) light treatment. The controllability is also shown to be largely dependent on the deposition temperature and thickness. The surface of a 16-nm-thick ALD TiO2 film deposited at 200 degrees C was shown to be super-hydrophilic (water contact angle< 1 degrees) by an UV treatment (similar to 3 mW/cm(2)) applied for only 8 min due to the photocatalytic activity of the films, while thinner films and films deposited at lower temperatures were not. Microscopic and optical characterizations prove that the difference mainly stems from the crystallinity, the bandgap energy and the defect density of the TiO2 films.
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