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    Comparison of the Physicochemical Properties of TiO2 Thin Films Obtained by Magnetron Sputtering with Continuous and Pulsed Gas Flow

    Year: 2018

    Journal: Coatings, Volume 8, NOV

    Authors: Wiatrowski, Artur; Mazur, Michal; Obstarczyk, Agata; Wojcieszak, Damian; Kaczmarek, Danuta; Morgiel, Jerzy; Gibson, Des

    Keywords: gas impulse magnetron sputtering; thin films; TiO2; microstructure; surface properties; optical properties; mechanical properties; hardness; scratch resistance

    In this this paper, a comparison of TiO2 thin films prepared by magnetron sputtering with a continuous and pulsed gas flow was presented. Structural, surface, optical, and mechanical properties of deposited titanium dioxide coatings were analyzed with the use of a wide range of measurement techniques. It was found that thin films deposited with a gas impulse had a nanocrystalline rutile structure instead of fibrous-like anatase obtained with a continuous gas flow. TiO2 thin films deposited with both techniques were transparent in the visible wavelength range, however, a much higher refractive index and packing density were observed for coatings deposited by the pulsed gas technique. The application of a gas impulse improved the hardness and scratch resistance of the prepared TiO2 thin films.
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