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Convex grid-patterned microstructures on silicon induced by femtosecond laser assisted with chemical etching

Year: 2019

Journal: Opt. Laser Technol., Volume 119, NOV

Authors: Wang, Cong; Tian, Yaxiang; Luo, Zhi; Zheng, Yu; Zhang, Fan; Ding, Kaiwen; Duan, Ji'an

Organizations: National Key R&D Program of China [2017YFB1104300]; Joint Funds of Ministry of Education of ChinaMinistry of Education, China [6141A02022130]

Keywords: Femtosecond laser; Chemical etching; Convex microstructures; Thermal oxidation

The convex grid-patterned microstructures were fabricated on a silicon substrate by using femtosecond laser assisted with chemical etching in this study. Along the femtosecond laser scanning traces, the isosceles trapezoidal microstructures were generated. According to Raman spectra and elemental distribution, the formation of the convex microstructures is investigated. Also, the effect of experimental parameters including laser power, scanning speed, etching duration and etching temperature on the microstructures' three-dimensional size is discussed in detail. In addition, the hydrophobic property of a surface with large-area convex grid-patterned microstructures was explored.