Year: 2019
Journal: Adv. Funct. Mater., Volume 29, JAN 24
Authors: Semmler, Johannes; Bley, Karina; Taylor, Robin N. Klupp; Stingl, Michael; Vogel, Nicolas
Organizations: Deutsche Forschungsgemeinschaft (DFG) through the Cluster of Excellence "Engineering of Advanced Materials"; DFG [VO 1824/6-1]; BASF SE
Keywords: colloidal lithography; colloids; electromagnetic scattering; haze factor; mathematical optimization; thin films