Year: 2020
Journal: Adv. Mater. Interfaces, Volume 7, AUG
Authors: Centeno, P; Alexandre, MF; Chapa, M; Pinto, JV; Deuermeier, J; Mateus, T; Fortunato, E; Martins, R; Aguas, H; Mendes, MJ
Organizations: FEDER funds through the COMPETE 2020 Programme [UID/CTM/50025/2019, PTDC/NAN-OPT/28430/2017, PTDC/NAN-OPT/28837/2017, PTDC/EAM-PEC/29905/2017]; FCT (Portuguese Foundation for Science and Technology)Portuguese Foundation for Science and Technology [UID/CTM/50025/2019, PTDC/NAN-OPT/28430/2017, PTDC/NAN-OPT/28837/2017, PTDC/EAM-PEC/29905/2017]; FCTPortuguese Foundation for Science and TechnologyEuropean Commission [SFRH/BD/148078/2019]
Keywords: colloidal-lithography; light management; photovoltaics; self-cleaning; superhydrophobicity