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    Ultralow surface energy self-assembled monolayers of iodo-perfluorinated alkanes on silica driven by halogen bonding

    Year: 2019

    Journal: Nanoscale, Volume 11, FEB 7, page 2401–2411

    Authors: Shou, Keyun; Hong, Jun Ki; Wood, Elliot S.; Hook, James M.; Nelson, Andrew; Yin, Yanting; Andersson, Gunther G.; Abate, Antonio; Steiner, Ullrich; Neto, Chiara

    Organizations: University of Sydney; AINSE Honours scholarship; Australian Research Council [LE0989541, LE120100027]; Adolphe Merkle Foundation

    Compact self-assembled monolayers (SAMs) of perfluorododecyl iodide (I-PFC12) of reproducible thickness (1.2 nm) are shown to form on silicon wafers. The SAMs have a high fluorine content (95%) and convey an extremely low surface energy to the silicon wafers (4.3 mN m(-1)), lower than previously reported in the literature for perfluorinated monolayers, and stable for over eight weeks. Shorter chain iodo-perfluorinated (I-PFC8) or bromo-perfluorinated molecules (Br-PFC10) led to less dense layers. The monolayers are stable to heating up to 60 degrees C, with some loss up to 150 degrees C. The I-PFC12 monolayer increases the work function of silicon wafers from 3.6 V to 4.4 eV, a factor that could be gainfully used in photovoltaic applications. The I-PFC12 monolayers can be transferred into patterns onto silica substrates by micro-contact printing. The NMR data and the reproducible thickness point to an upright halogen bonding interaction between the iodine in I-PFC12 and the surface oxygen on the native silica layer.
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