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    Universal Interfacial Control through Polymeric Nanomosaic Coating for Block Copolymer Nanopatterning

    Year: 2020

    Journal: ACS Nano, Volume 14, JUN 23, page 7140–7151

    Authors: Kim, Dong Hyup; Kim, So Youn

    Organizations: National Research Foundation of Korea (NRF) - Korea government (MSIT) [NRF-2018R1A5A1024127, NRF-2018R1A2B6008319]; Global Ph.D. Fellowship Program [NRF-2017H1A2A1042550]

    Keywords: block copolymers; self-assembly; nanopatterning; interfacial engineering thin films

    The employment of self-assembly of soft materials has been accepted as an inexpensive, robust, and reliable patterning method. As their self-assembly relies on the delicate molecular interactions near the substrate, a precise prediction/control of the interface structure and dynamics is critical to achieve desired nanostructures. Herein, a polymeric nano-mosaic (PNM) pattern is created from the air/water interfacial self-assembly of a block copolymer (BCP) and introduced as an effective interfacial energy control for substrates. As a demonstration, the PNM coating is employed to control the BCP film structures. The perpendicular orientation of BCP self-assembly, which requires neutral wetting conditions for both blocks, is difficult to achieve but can readily be obtained with the PNM coating upon a fine resolution of the pattern quality. The universal applicability of the PNM coating as an interfacial control has been confirmed on curved, flexible, and three-dimensional substrates. In addition, the PNM is introduced as an etching-free and reusable topcoat imparting free surface neutralization even for the high-chi BCP nanopatterning.
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