Traditional cleaning analysis methods often lack time-resolved and mechanistic information which can impede the development of effective cleaning formulations and protocols. QSense® QCM-D technology provides unique real-time data on interactions between cleaning agents, target soils, and surfaces, facilitating optimized product design and development.
Surfactants lower surface tension by disrupting chemical bonds at the air-liquid or liquid-liquid interface. The effectiveness of a surfactant can be assessed through surface tension measurements, with lower values indicating greater effectiveness. Additionally, surfactant efficiency is crucial, as minimizing the amount used is important for both economic and environmental reasons. Measuring the critical micelle concentration provides a way to evaluate surfactant efficiency.
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Surfactants stabilize air-liquid and liquid-liquid interfaces. The stability of these interfaces is meaningful in coatings and other formulations. Stability can be evaluated by studying the viscoelasticity of the interface through interfacial rheology measurements.
Surfactants are key components in many products and processes where the dynamics of surfactant-surface interactions are important. QCM-D is a powerful tool for time-resolved analysis of surfactant interactions with surfaces at the nanoscale.
QSense QCM-D technology is used to analyze and gain insights into the interactions of active pharmaceutical ingredients and excipients with materials used in manufacturing, storage, and administration.
Polymer-based systems are used in many applications to tailor interfacial properties and promote features such as biocompatibility, antifouling properties, and drug delivery capabilities. QCM-D analysis enables the monitoring of polymer-surface interactions, layer build-up, transitions between hydrated and dehydrated states, and molecular interactions.
The CMP (Chemical Mechanical Planarization) method relies on several nanoscale surface interaction processes. QSense® QCM-D technology enables the analysis and optimization of slurry additive and abrasive interactions with surfaces, as well as residue removal.
